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[PS-11-19 (Late News)] Activation and Recrystallization of Ultra-High-Dose Phosphorus-Implanted Silicon using Multi-Pulse Nanosecond Laser Annealing

^○H. Shin¹, H.-Y. Ryu¹, C.H. Song¹, H. Park¹, D.-H. Ko¹ (1.Yonsei Univ. (Korea))

https://doi.org/10.7567/SSDM.2019.PS-11-19