13:00 〜 15:00

[PS-2-08] Improvement of Hf-based MONOS Nonvolatile Memory Characteristics by Si Surface Atomically Flattening

^○S. Ohmi¹, Y. Horiuchi¹, S. Kudoh¹ (1.Tokyo Tech (Japan))

https://doi.org/10.7567/SSDM.2019.PS-2-08