Low-temperature Ge/Si interstitials-mediated local densification and nanocrystalli- zation of CVD Si3N4 for advanced Si photonics and electronics

1:00 PM - 3:00 PM

[PS-9-03] Low-temperature Ge/Si interstitials-mediated local densification and nanocrystalli- zation of CVD Si3N4 for advanced Si photonics and electronics

^○K.P. Peng¹, T.L. Huang¹, T. George¹, H.C. Lin¹, P.W. Li¹ (1.National Chiao Tung Univ. (Taiwan))