The Japan Society of Applied Physics

13:00 〜 15:00

[PS-9-03] Low-temperature Ge/Si interstitials-mediated local densification and nanocrystalli- zation of CVD Si3N4 for advanced Si photonics and electronics

K.P. Peng1, T.L. Huang1, T. George1, H.C. Lin1, P.W. Li1 (1.National Chiao Tung Univ. (Taiwan))

https://doi.org/10.7567/SSDM.2019.PS-9-03