Hydride Vapor Phase Epitaxy Reactor for Bulk GaN Substrate Manufacturing

V. Voronenkov

11:05 AM - 11:07 AM

[PS-11-11] Hydride Vapor Phase Epitaxy Reactor for Bulk GaN Substrate Manufacturing

^○V. Voronenkov^1,2, N. Bochkareva¹, R. Gorbunov^1,2, A. Zubrilov^1,2, V. Kogotkov², P. Latyshev², Y. Lelikov^1,2, A. Leonidov², Y. Shreter^2,1 (1.Ioffe Institute (Russia), 2.TRINITRI-Technology (Russia))

2019 International Conference on Solid State Devices and Materials

[PS-11-11] Hydride Vapor Phase Epitaxy Reactor for Bulk GaN Substrate Manufacturing