Activation and Recrystallization of Ultra-High-Dose Phosphorus-Implanted Silicon using Multi-Pulse Nanosecond Laser Annealing

2019 International Conference on Solid State Devices and Materials

Sep 2, 2019 - Sep 5, 2019
Nagoya University

11:21 AM - 11:23 AM

^○H. Shin¹, H.-Y. Ryu¹, C.H. Song¹, H. Park¹, D.-H. Ko¹ (1.Yonsei Univ. (Korea))