10:45 〜 10:47 [PS-8-01] SiC Quantum Dots in Si-Oxide Layer Fabricated by Double Hot-Si+/C+-Ion Implantation Technique T. Mizuno1,○R. Kanazawa1, T. Aoki1, T. Sameshima2 (1.Kanagawa Univ. (Japan), 2.Tokyo Univ. of Agri. and Tech. (Japan))
