11:15 〜 11:17
[PS-8-16] Fabrication of MoS2 layers on free-standing GaN for heterojunction photoresponsive device applications
○P. Desai1, A.K. Ranade1, R.D. Mahyavanshi1, M. Tanemura1, G. Kalita1,2
(1.Nagoya Inst. of Tech. (Japan), 2.Frontier Res. Inst. for Material Sci. (Japan))