11:19 〜 11:21
[PS-8-18] Development of Fabrication process for tin sulfide (SnSX) thin films by solution-based atmospheric-pressure mist CVD
○S. Sato1, P. Rutthongjan1, L. Liu1,2,3, G.T. Dang1,2,3, T. Kawaharamura1,2,3
(1.Eng. Course, Graduate School of Engineering, Kochi Univ. of Technol. (Japan), 2.School of Systems Engineering, Kochi Univ. of Technol. (Japan), 3.Center for Nanotechnology, Res. Inst., Kochi Univ. of Technol. (Japan))