The Japan Society of Applied Physics

14:15 〜 14:30

[A-1-02] Critical Impact of Ferroelectric-Phase Formation Annealing on MFIS Interface of HfO2-Based Si FeFETs

〇Kasidit Toprasertpong1, Kento Tahara1, Taichiro Fukui1, Zaoyang Lin1, Kouhei Watanabe1, Mitsuru Takenaka1, Shinichi Takagi1 (1. Univ. of Tokyo(Japan))

https://doi.org/10.7567/SSDM.2020.A-1-02