2:15 PM - 2:30 PM
[A-1-02] Critical Impact of Ferroelectric-Phase Formation Annealing on MFIS Interface of HfO2-Based Si FeFETs
〇Kasidit Toprasertpong1, Kento Tahara1, Taichiro Fukui1, Zaoyang Lin1, Kouhei Watanabe1, Mitsuru Takenaka1, Shinichi Takagi1
(1. Univ. of Tokyo(Japan))
https://doi.org/10.7567/SSDM.2020.A-1-02