12:00 PM - 12:15 PM

[A-4-04] On-Wafer Recorders for Assessing Wide Range Plasma Induced Charging Effect in FinFET Processes

Chi - Su¹, 〇Yi-Jie Chao¹, Chring-Jung Lin¹, Ya-Chin King¹ (1. National Tsing Hua Univ.(Taiwan))

https://doi.org/10.7567/SSDM.2020.A-4-04