Origin of Fermi Level De-Pinning of Metal Silicide, Rare-earth arsenide, TiN and Bi<br />Schottky Barriers

16:30 〜 16:45

[A-6-02] Origin of Fermi Level De-Pinning of Metal Silicide, Rare-earth arsenide, TiN and Bi
Schottky Barriers

〇John Robertson¹, Zhaofu Zhang¹, Yuzheng Guo² (1. Cambridge Univ.(UK), 2. Swansea Univ.(UK))