15:15 〜 15:30

[C-1-05] Preparation of reactively sputtered ZrO₂ films at low temperatures

〇Masaru Sato¹, Mayumi B. Takeyama¹ (1. Kitami Inst. of Tech.(Japan))

https://doi.org/10.7567/SSDM.2020.C-1-05