Characteristics of Rapidly Solid Phase Crystallized Amorphous Silicon Films Formed by Micro-Thermal-Plasma Jet Irradiation

Hoa ThiKhanh Nguyen

doi:https://doi.org/10.7567/SSDM.2020.J-5-02

2:15 PM - 2:30 PM

[J-5-02] Characteristics of Rapidly Solid Phase Crystallized Amorphous Silicon Films Formed by Micro-Thermal-Plasma Jet Irradiation

〇Hoa ThiKhanh Nguyen¹, Hiroaki Hanafusa¹, Yuri Mizukawa¹, Shohei Hayashi², Seiichiro Higashi¹ (1. Hiroshima Univ.(Japan), 2. Toray Res. Center(Japan))

https://doi.org/10.7567/SSDM.2020.J-5-02

2020 International Conference on Solid State Devices and Materials

[J-5-02] Characteristics of Rapidly Solid Phase Crystallized Amorphous Silicon Films Formed by Micro-Thermal-Plasma Jet Irradiation