3:15 PM - 3:30 PM

[K-1-04] A Framework for Sensitive Assessment of Plasma Process-Induced Damage in Si Substrates

〇Takashi Hamano¹, Keiichiro Urabe¹, Koji Eriguchi¹ (1. Kyoto Univ.(Japan))

https://doi.org/10.7567/SSDM.2020.K-1-04