16:45 〜 17:00

[K-10-04] Crystal Growth and Characterization of Topological Insulator BiSb Thin Films by Sputtering Deposition for SOT-MRAM Applications

〇Fan Tuo¹, Mustafa Tobah², Takanori Shirokura¹, Khang Nguyen^1,3, Nam Hai Pham^1,4,5 (1. Tokyo Inst. of Tech.(Japan), 2. Univ. of Illinois, UC(United States of America), 3. Ho Chi Minh City Univ. Of Edu.(Viet Nam), 4. Univ. of Tokyo(Japan), 5. JST CREST(Japan))

https://doi.org/10.7567/SSDM.2020.K-10-04