17:15 〜 17:30

[K-10-06] Ar/N₂ gas flow ratio dependence on the high-k LaB_xN_y thin film characteristics formed by RF sputtering

〇Kyung Eun Park¹, Hideki Kamata¹, Shun-ichiro Ohmi¹ (1. Tokyo Tech.(Japan))

https://doi.org/10.7567/SSDM.2020.K-10-06