Contactless Characterization of SiO<sub>x</sub>/c-Si by FTIR and μ-PCD applied to pMOS Devices

Mickael Lozach, Sommawan Khumpuang, Shiro Hara

doi:https://doi.org/10.7567/SSDM.2021.A-6-10

5:11 PM - 5:18 PM

[A-6-10] Contactless Characterization of SiO_x/c-Si by FTIR and μ-PCD applied to pMOS Devices

〇Mickael Lozach¹, Sommawan Khumpuang^1,2, Shiro Hara^1,2 (1.Minimal Fab Promoting Organization, 2.National Institute of Advanced Industrial Science and Technology (AIST))

https://doi.org/10.7567/SSDM.2021.A-6-10

2021 International Conference on Solid State Devices and Materials

[A-6-10] Contactless Characterization of SiOx/c-Si by FTIR and μ-PCD applied to pMOS Devices

[A-6-10] Contactless Characterization of SiO_x/c-Si by FTIR and μ-PCD applied to pMOS Devices