15:45 〜 16:15

[C-6-01 (Invited)] An overview of recent trends in ALD/CVD chemistry for Advanced IC interconnects

〇Jean-Marc Girard¹、Venkateswara Pallem²、Benjamin Jurcik² (1.Air Liquide Advanced Materials、2.Air Liquide Innovation Campus Delaware)

https://doi.org/10.7567/SSDM.2021.C-6-01