0.64um Non-metallic Pixel Isolation Technology for High Sensitivity in CMOS Image Sensors

16:43 〜 16:50

[E-2-06] 0.64um Non-metallic Pixel Isolation Technology for High Sensitivity in CMOS Image Sensors

〇Hye Yeon Park¹、Boseong Kim¹、Jeongmin Bae¹、Taehan Kim¹、Yunki Lee¹、Bumsuk Kim¹、JungChak Ahn¹ (1.Samsung Electronics)