14:30 〜 14:37

[J-5-02] Operando Hard X-ray Photoelectron Spectroscopy Study of Buried Interface Chemistry of Au/In₂O₃/Al₂O₃/p⁺-Si Stacks under Applied Bias

〇Ibrahima Gueye¹、Riku Kobayashi^1,2、Shigenori Ueda¹、Toshihide Nabatame³、Kazuhito Tsukagoshi³、Atsushi Ogura^2,4、Takahiro Nagata^1,2,3 (1.National Institute for Materials Science (NIMS), Research Center for Functional Materials, 1-1 Namiki, Tsukuba, Ibaraki 305-0044、2.Graduate School of Science and Technology, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki, Kanagawa 214-8571、3.International Center for Materials Nanoarchitectonics (WPI-MANA), NIMS, 1-1 Namiki, Tsukuba, Ibaraki 305-0044、4.Meiji Renewable Energy Laboratory, Meiji University, 1-1-1 Higashimita, Tama-ku, Kawasaki, Kanagawa 214-8571)

https://doi.org/10.7567/SSDM.2021.J-5-02