Difference in   Ge and Ni   Underlayer for Nanographene Synthesis Using Soft X-ray Irradiation

2:30 PM - 2:37 PM

[K-1-02] Difference in Ge and Ni Underlayer for Nanographene Synthesis Using Soft X-ray Irradiation

〇Akira Heya¹, Kazuhiro Kanda², Ryo Yamasaki³, Koji Sumitomo¹ (1.Univ. of Hyogo, 2.LASTI, Univ. of Hyogo, 3.Tocalo Co., Ltd.)