Difference in   Ge and Ni   Underlayer for Nanographene Synthesis Using Soft X-ray Irradiation

14:30 〜 14:37

[K-1-02] Difference in Ge and Ni Underlayer for Nanographene Synthesis Using Soft X-ray Irradiation

〇Akira Heya¹、Kazuhiro Kanda²、Ryo Yamasaki³、Koji Sumitomo¹ (1.Univ. of Hyogo、2.LASTI, Univ. of Hyogo、3.Tocalo Co., Ltd.)