14:14 〜 14:21

[K-5-03] Effect of Reactive Gas Condition on Nonpolar AlN Film Growth on MnS/Si(100) by Reactive DC Sputtering

〇Masaya Morita^1,2、Keiji Ishibashi^3,2、Kenichiro Takahashi^3,2、Shigenori Ueda²、Toyohiro Chikyow⁴、Atsushi Ogura^1,5、Takahiro Nagata^2,1,6 (1.Meiji Univ.、2.RCFM, NIMS、3.COMET Inc.、4.MaDIS, NIMS、5.MREL、6.MANA, NIMS)

https://doi.org/10.7567/SSDM.2021.K-5-03