2:14 PM - 2:21 PM

[K-5-03] Effect of Reactive Gas Condition on Nonpolar AlN Film Growth on MnS/Si(100) by Reactive DC Sputtering

〇Masaya Morita^1,2, Keiji Ishibashi^3,2, Kenichiro Takahashi^3,2, Shigenori Ueda², Toyohiro Chikyow⁴, Atsushi Ogura^1,5, Takahiro Nagata^2,1,6 (1.Meiji Univ., 2.RCFM, NIMS, 3.COMET Inc., 4.MaDIS, NIMS, 5.MREL, 6.MANA, NIMS)

https://doi.org/10.7567/SSDM.2021.K-5-03