2:30 PM - 2:45 PM

[K-6-04 (Late News)] Growth of SiC Thin Film on Various Metal Substrates by CVD Using Vinylsilane

〇Koki Ono¹, Takashi Koide¹, Yong Jin², Yuuki Tsutiizu¹, Takuhiro Hasegawa¹, Shigeo Yasuhara², Wakana Takeuchi¹ (1. Aichi Institute Technology (Japan), 2. Japan Advanced Chemicals Ltd. (Japan))

Presentation style: On-site (in-person)

https://doi.org/10.7567/SSDM.2022.K-6-04