09:30 〜 09:45
[A-3-02] Ultra-High Packing Density Vertical GaN Nanocolumn SBDs using Bottom-Up Growth Approach
We have fabricated vertical Gallium Nitride (GaN) nanocolumn Schottky barrier diodes (NC-SBDs) on a GaN-template on sapphire, with a packing density equivalent to over 10 million columns/mm2, using Ti mask selective area growth (SAG) by rf-plasma-assisted molecular beam epitaxy (rf-MBE). The fabricated NC-SBDs with 250 nm-diameter and drift length of 1.3 μm have a breakdown voltage of 260 V. Since the dielectric reduced surface field (RESURF) effect has not optimized in this work, further improvements can be expected in the future.
