9:30 AM - 9:45 AM
[C-3-02] High-Performance Submicron IGZO TFTs Fabricated with a Maximum Temperature of 110 ℃
We have successfully demonstrated a low-temperature process (Tmax=110 oC) for fabricating submicron IGZO TFTs. In this newly-refined fabrication approach, Al2O3 gate-oxide deposited at 110 oC using atomic layer deposition (ALD) is employed which allows us to utilize an organic photoresist bridge for tailoring the profiles of major thin films in the devices. Good device performance with field-effect mobility of 12.1 cm2/V-s is demonstrated in the fabricated devices.
