2:30 PM - 2:45 PM
[C-7-04] Demonstration of Scalability of a Planar Silicon Integrated Thermoelectric Device
In a planar thermoelectric (TE) device using Si nanowires (Si-NWs), the scaling effectit is predicted where that the areal power density improves by shortening the length of Si-NW. In this study, we fabricated integrated TE devices with varying the length of Si-NWs between 250 nm to 1000 nm and evaluated their power generation capacity. According to the experimental result, the shortest Si-NW length device shows the highest areal power density. This is because short Si-NWs can reduce electrical resistance and enable high-density integration. This study demonstrated the scaling effect and provided guidelines for the structural design of the planar integrated TE device.
