10:00 AM - 10:15 AM
[E-5-05] Variable Photocurrent Method Characterization of Subgap Defects in In 2O 3 TFT
We propose the Variable Photocurrent Method (VPM) as a “light-write-electric-read” method to characterize subgap defects in thin In2O3 TFTs. We demonstrate the VPM in characterizing defects near the bandgap edge by comparing the annealing-induced absorption coefficient in In2O3 TFTs with thin channel layers (~15 nm). Unlike the Constant Photocurrent Method (CPM), adjusting the light source power to maintain a constant current is unnecessary in VPM, which makes it convenient and effective in probing subgap states.
