09:45 〜 10:00
[F-3-04] Improved Anti-fatigue and Fatigue Recovery Capability of the HfO 2-ZrO 2 Ferroelectric Capacitors with Superlattice Structure
In this work, different HfO2-ZrO2 superlattice (SL) structure ferroelectric films were grown by atomic layer deposition (ALD) and studied systematically. The HfZrOx (HZO) alloy was used as a comparison device. Compared to the HZO capacitor, the SL capacitors could effectively suppress the defects diffusion during the P-V cycling, thus effectively improving the anti-fatigue characteristics and the fatigue recovery capability. The results indicate that the SL structure has high potential in future ferroelectric memory applications with excellent stability and recovery capability.
