The Japan Society of Applied Physics

2023 International Conference on Solid State Devices and Materials

2023 International Conference on Solid State Devices and Materials

Sep 5, 2023 - Oct 31, 2023
Nagoya Congress Center

9:30 AM - 9:45 AM

[F-5-02] Crystallinity and Composition of Sc / Si:P System for Advanced Contact Applications

○Bert Pollefliet1,2, Clement Porret2, Jean-Luc Everaert2, Kiroubanand Sankaran2, Xiaoyu Piao2, Erik Rosseel2, Thierry Conard2, Andrea Impagnatiello2, Yosuke Shimura2, Andriy Hikavyy2, Roger Loo2, André Vantomme1, Clement Merckling1,2 (1. KU Leuven (Belgium), 2. imec (Belgium))

https://doi.org/10.7567/SSDM.2023.F-5-02

Sc contacts to Si:P have shown great potential for NMOS devices. However, the promising properties of this material system are not fully understood. This work provides new insights into the crystallinity and composition of sinter annealed TiN / Sc / Si:P stacks. After silicidation, two distinct phases are evidenced, with orthorhombic ScSi lying atop a thin Sc1-x-ySixPy interfacial layer that is lattice matched with the underlaid Si:P, of prime importance for lowering the contact resistance. The formed ScSi phase is thermally stable up to ~ 700°C and its evolution is imaged across a large temperature range.