11:30 〜 11:45
[H-6-04] A Novel Tensile Strained Ge/InGaAs Quantum Well Laser for MIR Applications
A tensile strained Ge/InGaAs quantum well (QW) laser is proposed and evaluated using in-house materials growth and characterization results feeding to TCAD solvers. This e-Ge/InGaAs laser provides type-I band alignment with high valence band and conduction band offsets, along with high minority carrier lifetime. At indium (In) = 28% in InGaAs, the e-Ge active layer is a direct-gap material due to the tensile strain and lasing is possible at a wavelength of ~ 2.1 µm with a threshold current density ~ 6 kA/cm2, an improvement over existing Ge lasers and comparable to direct gap MIR lasers. The high band offsets and carrier lifetime enable this e-Ge QW laser to provide a high net material gain of 1211 cm-1 with an improved efficiency of 20 %.
