The Japan Society of Applied Physics

11:30 〜 11:45

[H-6-04] A Novel Tensile Strained Ge/InGaAs Quantum Well Laser for MIR Applications

Rutwik Joshi1, Steven Johnston2, Sengunthar Karthikeyan1, Mantu Hudait1 (1. Virginia Tech, (United States of America), 2. National Renewable Energy Lab. (United States of America))

https://doi.org/10.7567/SSDM.2023.H-6-04

A tensile strained Ge/InGaAs quantum well (QW) laser is proposed and evaluated using in-house materials growth and characterization results feeding to TCAD solvers. This e-Ge/InGaAs laser provides type-I band alignment with high valence band and conduction band offsets, along with high minority carrier lifetime. At indium (In) = 28% in InGaAs, the e-Ge active layer is a direct-gap material due to the tensile strain and lasing is possible at a wavelength of ~ 2.1 µm with a threshold current density ~ 6 kA/cm2, an improvement over existing Ge lasers and comparable to direct gap MIR lasers. The high band offsets and carrier lifetime enable this e-Ge QW laser to provide a high net material gain of 1211 cm-1 with an improved efficiency of 20 %.