The Japan Society of Applied Physics

4:45 PM - 5:00 PM

[M-2-03] Tuning CVD growth conditions for enlarging monolayer MoS 2 crystal

Kakeru Fujii1, Toshiya Okabe1, Kentaro Watanabe1,2 (1. Shinshu Univ. (Japan), 2. IFES, Shinshu Univ. (Japan))

https://doi.org/10.7567/SSDM.2023.M-2-03

We developed 3-zone Chemical Vapor Deposition (CVD) systems and investigated CVD conditions of monolayer (ML)-MoS2 crystals on soda-lime glass substrate to enlarge its grain size. We obtained large ML-MoS2 islands (67 µm) by optimizing experimental conditions such as heating temperatures, heat timing of precursor sulfur, and positions of MoO3 precursor. In addition, by using quartz test tube instead of ceramic boat for MoO3 supply, we obtained 1ML-to-bulk MoS2 in the same CVD system depending on heating temperature and weight of MoO3 precursor, which is beneficial for tuning MoS2 layer numbers for few-layer MoS2 FET applications.