2:45 PM - 3:00 PM
[N-7-05] Theoretical Investigation of β-(Al xGa 1- x) 2O 3/Ga 2O 3 Modulation-Doped Field-Effect Transistors with Dual-Metal Gate Structure
β-(AlxGa1-x)2O3/Ga2O3 (AlGaO/GaO) modulation-doped field-effect transistors (MODFETs) with a dual-metal-gate (DMG) architecture are designed, and the electrical characteristics of DMG devices are theoretically investigated in comparison with the single-metal gate (SMG) devices by the TCAD simulation. The simulated results demonstrate that the DMG MODFETs possess a superior transconductance (gm), current gain cut-off frequency (fT), and power gain cut-off frequency (fMAX), which is attributed to the regulated electric field in channel by the DMG structure. Furthermore, the geometrical parameters of DMG MODFETs are also optimized. With a gate length of 0.1 μm, the peak values of fT and fMAX are obtained as 49.4 GHz and 50.5 GHz, respectively. The AlGaO/GaO MODFET with DMG structure provides a promising strategy for high-power RF operation.
