This paper presents a method for verifying the accuracy of the deposition thickness set on a sputtering machine by leveraging the impact of film deposition on theresonant frequency of a MEMS resonator. We designed astress-suppressed resonator to minimize bendingdeformation and integrated a two-stage high-gain (140dB) transimpedance amplifier (TIA) on a single chip. Toensure consistent measurements, a standardized CMOSMEMS fabrication process was utilized for chipproduction, resulting in stable calibration chips with consistent frequency. The experimental results showthat the first resonant frequency is 213.4 kHz. With adeposited gold thickness of 12.5 nm, the resonantfrequency is increased by 17 kHz to 230.4 kHz,corresponding to a sensitivity of 1.36 kHz/nm.