The Japan Society of Applied Physics

[PS-4-08] Reaching the GaN Theoretical Limit (FOM of 6.6 GW/cm2) by Fabricating Vertical GaN Diodes with Micron Column Schottky Contact

Shuai Li1, Bo Li1, Zhengweng Ma1, Huakai Yang1, Shijie He1, Jiajun Han2, Yu Li1, Xiaohua Li1, Wei He1, Xinke - Liu1 (1. Shenzhen Univ. (China), 2. South China Normal Univ. (China))

https://doi.org/10.7567/SSDM.2023.PS-4-08

With the rise of gallium nitride (GaN) and the booming market of low and medium power diodes, the excellent properties of GaN materials such as wide band gap and high thermal conductivity are receiving much more attention in manufacturing devices. In this paper, the new devices with micron column schottky contact are shown, and the diameter of each micron column is 5 μm. By varying the spacing of the micron column, an ultra-low Ron,sp of 0.07 mΩ·cm2 and a low Von of 0.45 V for the diode are achieved.The SBD in this work achieves a power device figure-of-merit VBR2/RON of 6.6 GW/cm2, which is the highest FOM among the reported data so far. And, these SBDs are reaching the theoretical limit of GaN material.