13:40 〜 13:42
[SO-PS-01-06] Investigation of SiGe/Si Super Lattice GAAFET and CMOS Inverter
This study introduces a 3-stacked SiGe/Si super-lattice channel GAAFET grown by LPCVD epitaxy. The SL GAAFET shows improved electrical characteristics, including higher ION/IOFF ratio, and lower subthreshold slope (SS). Furthermore, thorough demonstrations of SL-GAAFET CMOS inverter are also provided. The proposed SL-GAAFET is compatible with the current Si-based technology platform, indicating its potential for extending CMOS scaling.
