The Japan Society of Applied Physics

13:42 〜 13:44

[SO-PS-02-07] Comparative Study of Variability in FeFET Memories with Different Erase Voltages

JAY LIU1, Cheng-Hung Wu1, Masaharu Kobayashi2, Chun-Jung Su3, Vita Pi-Ho Hu1 (1. National Taiwan Univ. (Taiwan), 2. Univ. of Tokyo (Japan), 3. National Yang Ming Chiao Tung Univ. (Taiwan))

This study investigates the impact of erase voltage on the variability of ferroelectric field effect transistor (FeFET) devices. Our results indicate that an optimal erase voltage can significantly reduce device-to-device variability in the high threshold voltage (HVT) state for FeFETs. We employed a systematic pulsing methodology and demonstrated that the variability of FeFET devices is closely linked to the dipole switching and trapping behavior, and therefore can be effectively controlled by adjusting the erase voltage. The results highlight the significance of erase voltage in enhancing the performance and reliability of FeFETs.