1:42 PM - 1:44 PM
[SO-PS-08-07] Control of Ge Nanowire Orientation in Selective-Area VLS Growth on Si (111)
We investigate the effects of GeH4 partial pressure on the selective-area growth of Ge nanowires (NWs) by the vapor-liquid-solid (VLS) method using position-controlled circular patterns of Au thin film catalysts on Si (111) substrates. By decreasing a GeH4 partial pressure, Ge NWs are grown preferentially in the <111> directions, possibly depending on a diameter of circular Au catalyst patterns.
