The Japan Society of Applied Physics

13:38 〜 13:40

[SO-PS-11-05] Radical Treatment of Graphene Oxide Using Heated Catalyst, H2 and NH3 Gas

Akira Heya1, Kenta Fujimoto1, Yoshiaki Matsuo2, Junichi Inamoto2, Koji Sumitomo1 (1. Univ. of Hyogo (Japan), 2. Univ. of Hyogo (Japan))

Reduction and N doping of graphene oxide (GO) by H and N radicals generated on a heated metal was investigated using H2 and NH3 gas. The GO reduction occurred not only with H2 gas but also with NH3 gas. The resistance of reduced GO (r-GO) produced by this process was reduced to a range between 8×103 and 2×105 Ohm at 170 °C. The resistance of r-GO treated with NH3 gas was lower than that of r-GO treated with H2 gas, indicating that the resistance changed with the mixing ratio of NH3 and H2 gas. This suggests the possibility of N doping by radical treatment.