14:02 〜 14:04
[SO-PS-11-17] Enhancement of Mg Induced Lateral Crystallization of Amorphous Ge on Insulating Substrate by Two-Step Annealing
We have investigated Mg induced lateral crystallization of amorphous Ge on insulating substrate. Mg induced lateral crystallization length was at most ~ 2 µm after annealing at 350 °C for 60 min. To enhance the Mg induced lateral crystallization, two-step annealing effect on Mg induced lateral crystallization is investigated. This process significantly enhanced the Mg induced lateral crystallization length (~ 6 times). This demonstrates the two-step annealing process is highly effective on metal induced lateral crystallization of amorphous Ge on insulating substrate.
