The 102nd CSJ Annual Meeting

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Academic Program [Oral A]

20. Materials Chemistry -Basic and Application- » Oral A

[C205-3am] 20. Materials Chemistry -Basic and Application-

Fri. Mar 25, 2022 9:00 AM - 11:40 AM C205 (Online Meeting)

Chair: Haruka Omachi, Takuya Fujimura

9:20 AM - 9:30 AM

[C205-3am-03] Analysis of organic additives in copper-plating bath by use of boron-doped diamond electrode

○Taiga Taiga Saeki1, Sachio Yoshihara1 (1. The University of Utsunomiya)

[Lang.] Japanese

Keywords:Boron-doped diamond, Copper pyrophosphate plating bath, Quadrol, Electrochemical analysis