Oral Presentation
MOS Gate Stacks and Device Processing
Thu. Oct 3, 2019 10:45 AM - 12:15 PM Room A (Kyoto International Conference Center)
10:45 AM - 11:15 AM
*Tamotsu Hashizume1,2 (1. Research Center for Integrated Quantum Electronics, Hokkaido Univ.(Japan), 2. Institute of Materials and Systems for Sustainability (IMaSS), Nagoya Univ.(Japan))
Schedule
11:15 AM - 11:30 AM
*Fabrizio Roccaforte1, Monia Spera1,2,3, Salvatore Di Franco1, Corrado Bongiorno1, Raffaella Lo Nigro1, Patrick Fiorenza1, Filippo Giannazzo1, Giuseppe Greco1 (1. CNR-IMM(Italy), 2. University of Catania(Italy), 3. University of Palermo(Italy))
Schedule
11:30 AM - 11:45 AM
Noah Opondo1, *James A Cooper2, Hangjie Liao1, Weinong W. Chen1, Dallas T. Morrisette1 (1. Purdue Univ.(United States of America), 2. Sonrisa Research, Inc., and Purdue Univ.(United States of America))
Schedule
11:45 AM - 12:00 PM
*Mitsuaki Kaneko1,2, Alexander Tsibizov2, Tsunenobu Kimoto1, Ulrike Grossner2 (1. Kyoto Univ.(Japan), 2. ETH Zurich(Switzerland))
Schedule
12:00 PM - 12:15 PM
*Johanna Mueting1, Viktor Bobal2, Marc Georg Willinger1, Steffen Reidt3, Lasse Vines2, Ulrike Grossner1 (1. ETH Zurich(Switzerland), 2. University of Oslo(Norway), 3. IBM Research(Switzerland))
Schedule
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