[Mo-P] Poster Presentation

[Mo-P-06] Achievement of low carrier concentration of high-uniformity SiC films grown by high speed wafer rotation vertical CVD tool

*Yoshiaki Daigo¹, Akio Ishiguro¹, Shigeaki Ishii¹, Takehiko Kobayashi¹, Yoshikazu Moriyama¹ (1. NuFlare Technology, Inc.,(Japan))