The 68th JSAP Spring Meeting 2021

Presentation information

Oral presentation

13 Semiconductors » 13.5 Semiconductor devices/ Interconnect/ Integration technologies

[16a-Z26-1~11] 13.5 Semiconductor devices/ Interconnect/ Integration technologies

Tue. Mar 16, 2021 9:00 AM - 12:00 PM Z26 (Z26)

Hiroshi Inokawa(Shizuoka Univ.), Takahiro Mori(AIST)

10:00 AM - 10:15 AM

[16a-Z26-5] High-Frequency Rectifying Characteristics of Si Nanowire Single-Electron Transistor

〇(D)Alka Singh1, Shogo Matsumoto2, Hiroaki Satoh2,3, Hiroshi Inokawa1,2,3 (1.GSST, Shizuoka University, 2.GSIST, Shizuoka University, 3.RIE, Shizuoka University)

Keywords:semiconductor, single-electron transistor, rectifier

Rectifying operation beyond the conventional cutoff
frequency of single-electron transistors (SETs) [1] is
due to asymmetry in the tunneling rate with respect
to drain voltage, which is responsible for asymmetry
in the drain current, resulting in rectification [2].
Heavily doped Si nanowire-based SET is used for
verifying it experimentally (Fig. 1).