2021年第68回応用物理学会春季学術講演会

講演情報

一般セッション(口頭講演)

13 半導体 » 13.5 デバイス/配線/集積化技術

[16a-Z26-1~11] 13.5 デバイス/配線/集積化技術

2021年3月16日(火) 09:00 〜 12:00 Z26 (Z26)

猪川 洋(静大)、森 貴洋(産総研)

10:00 〜 10:15

[16a-Z26-5] High-Frequency Rectifying Characteristics of Si Nanowire Single-Electron Transistor

〇(D)Alka Singh1、Shogo Matsumoto2、Hiroaki Satoh2,3、Hiroshi Inokawa1,2,3 (1.GSST, Shizuoka University、2.GSIST, Shizuoka University、3.RIE, Shizuoka University)

キーワード:semiconductor, single-electron transistor, rectifier

Rectifying operation beyond the conventional cutoff
frequency of single-electron transistors (SETs) [1] is
due to asymmetry in the tunneling rate with respect
to drain voltage, which is responsible for asymmetry
in the drain current, resulting in rectification [2].
Heavily doped Si nanowire-based SET is used for
verifying it experimentally (Fig. 1).