Surface passivation effect of SiO2 film prepared by ALD method

Presentation information

Oral presentation

16 Amorphous and Microcrystalline Materials » 16.3 Bulk, thin-film and other silicon-based solar cells

Thu. Mar 18, 2021 10:00 AM - 12:15 PM Z29 (Z29)

11:45 AM - 12:00 PM

〇(D)Kenshiro Usuki^1,2, Toshimitsu Mochizuki², Tanahashi Katsuto², Hidetaka Takato², Katsuhiko Yamaguchi¹ (1.Fukushima Univ., 2.AIST)

Keywords:Atomic Layer Deposition method, Silicon oxide