The 68th JSAP Spring Meeting 2021

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Symposium (Oral)

Symposium » Progresses and future on EUV and soft x-ray imaging techniques

[18p-Z03-1~10] Progresses and future on EUV and soft x-ray imaging techniques

Thu. Mar 18, 2021 2:30 PM - 6:35 PM Z03 (Z03)

Mitsunori Toyoda(Tokyo Polytechnic Univ.), Toshihide Tsuru(Yamagata Univ.), Tetsuo Harada(Univ. of Hyogo), Ohigashi Takuji(IMS)

5:05 PM - 5:20 PM

[18p-Z03-7] EUV mask observation by coherent EUV scatterometry microscope

〇Tetsuo Harada1, Takeo Watanabe1 (1.Univ. of Hyogo)

Keywords:EUV Lithography, Soft X-ray, Lensless imaging

EUV lithography is used for high volume manufacturing of semiconductor device since 2019. At EUV mask, reflection phase control of pattern is very important for reduce the aberration, which is caused by the mask structure. We have developed a lensless EUV microscope based on coherent-diffraction-imaging method. This microscope observes amplitude and phase image of EUV mask pattern and the phase defect.